Equipment

Transmission Electron Microscope (TEM)

The 200 kV high resolution transmission electron microscope (JEOL Neoarm) is used for imaging and analysis of samples. In addition, Lorentz-TEM can be used for magnetic imaging in fields up to 2 T und temperatures down to 100 K.

Secondary-Ion-Mass-Spectrometer (SIMS)

SIMS is used to analyze the composition of solid surfaces by sputtering the surface with a focused ion beam and collecting and analyzing ejected secondary ions. From the mass/charge ratios of these secondary ions the surface composition can be determined.

Tandem Ion Accelerator

This setup is used for Rutherford Backscattering Spectrometry (RBS) to determine the composition and depth profile of thin film systems by measuring the backscattering of high energy He+ ions (2 MeV).

Magnetron Sputter Deposition

The UHV sputter deposition system (Bestec GmbH) is equipped with a wide range of dielectric and metallic materials for thin film preparation.

Pulsed Laser Deposition (PLD)

Several PLD systems, where a laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited, are available.

Molecular Beam Epitaxy (MBE) Deposition

This UHV deposition system is used for the preparation of high quality thin film systems and equipped with Reflection High Energy Electron Diffraction (RHEED) analysis.

Magnetron Sputter Deposition / MBE System

This home-build combined UHV magnetron sputtering / MBE system is used for depositing a wide variety of film compositions and layer structures.

Organic Molecular Beam Deposition (OMBD) and Thermal Metal Evaporation

Several high vacuum chambers for organic molecular beam depostion (OMBD) for the deposition of organic thin films and organic blends with controlled mixing ration of two components are available.

Chemical Vapour Deposition (CVD)

Several CVD setups are available to produce high-quality solid materials including single-crystalline diamond thin films.

Superconductive Quantum Interference Device - Vibrating Sample Magnetometer (SQUID-VSM)

This magnetometer combines the high sensitivity (≤ 10-8 emu) of the SQUID with high speed of measurement of a conventional VSM. Measurements can be performed with magnetic fields up to +- 7 Tesla in a temperature range from 2.5 K up to 1000 K.

Magneto-Optical Kerr Effect Magnetometer (MOKE)

Two home-built polar MOKE systems with external magnetic fields up to 2 T operating at room temperature allowing also angle dependent measurements are available.

Scanning Probe Microscope (AFM/MFM)

For the characterization of magnetic domain structures and surface morphologies of nanoscale systems, a Bruker Dimension ICON3 scanning probe microscope operating at room temperature is available.

Scanning Magneto-Resistive Microscope (SMRM)

This home-built variable-temperature SMRM is specifically designed for the study of magnetic thin films and arrays of nanostructures. The device uses a state-of-the-art magnetic recording head of a hard disk drive.

Rigaku SmartLab® XRD

A high-resolution X-ray diffractometer (XRD) with a high-flux 9 kW rotating anode coupled with a high-energy-resolution 2D multidimensional semiconductor detector, allowing various applications including reciprocal space maps.

Energy Dispersive X-ray Fluorescence Spectrometer (EDX)

The spectrometer (Shimadzu EDX-720) is used for rapid determination of film thickness and elemental composition of the films.

Raman Spectrometer

The Raman effect, which is a light scattering phenomenon, is used to observe vibrational, rotational, and other low-frequency modes in a material system.

Electro- and Photoluminescence Cryostates

Multiple liquid nitrogen and helium cryostates are available for measuring electro- and photoluminescence at temperature ranges between 4 and 350 K.

High Temperature Resistivity and Seebeck System

The high temperature Seebeck and resistivity setup (RT-750 K) is used for electrical characterization of thermoelectric thin film samples.

Hall- and Magnetoresistivity Setup

The device is used to measure the temperature and magnetic field dependent resistivity and the Hall effect using the Van-der-Pauw method.

Glovebox

This nitrogen glovebox allows for handling and storing materials senstive to oxygen and water under inert gas atmosphere. Addtionally, a depostion chamber and many characterization techniques are accessible from this box in order to avoid contamination.

Clean Room

Our clean room is equipped with an Electron Beam Lithography (EBL) system, optical lithography tools,

wire bonders, as well as spin-coating systems.

Contact information

Adress:

University of Augsburg
Instutite for physics
Chair for experimental physics 4
Building R - Physics North
Universitätsstr. 1
86159 Augsburg

Phone: +49 821 598 - 3402 (Office)

Fax: +49 821 598 - 3425

E-Mail: sekretariat_ep4@physik.uni-augsburg.de (Office)

Experimental Physics IV

Equipment

Clean Room

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